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Title: Mass and optical spectroscopy of CF←4 + O←2 plasmas and their application to the etching of Si, Ge and SiGe alloys.
Author: Chatfield, Robert J.
Awarding Body: University of Bristol
Current Institution: University of Bristol
Date of Award: 1993
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Reactive ion etching Manufacturing processes Plasma (Ionized gases) Electric apparatus and appliances Electronic apparatus and appliances