Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.337909
Title: Novel deposition of doped amorphous silicon and related materials.
Author: Miyajima, Shumpei.
ISNI:       0000 0001 3412 7489
Awarding Body: University of Cambridge
Current Institution: University of Cambridge
Date of Award: 1994
Availability of Full Text:
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.337909  DOI: Not available
Keywords: Semiconductor; Thin films Solid state physics
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