Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.335788
Title: Millisecond duration thermal processing of silicon layers.
Author: Smith, David Andrew.
ISNI:       0000 0001 3429 5466
Awarding Body: University of Cambridge
Current Institution: University of Cambridge
Date of Award: 1988
Availability of Full Text:
Full text unavailable from EThOS. Please contact the current institution's library directly if you wish to view the thesis.
Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.335788  DOI: Not available
Keywords: Semiconductors Solid state physics Electric apparatus and appliances Electronic apparatus and appliances
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