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Title: Hot electron induced degradation in VLSI MOS devices.
Author: Zhao, Si Ping.
Awarding Body: University of Liverpool
Current Institution: University of Liverpool
Date of Award: 1993
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID:  DOI: Not available
Keywords: Substrate hot electron injection; CMOS wafers Solid state physics Electric circuits Electronic circuits