Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.297037
Title: Characterization of dry etching processes of III-V semiconductors in silicon tetrachloride plasmas.
Author: Murad, Saad Kheder.
Awarding Body: University of Glasgow
Current Institution: University of Glasgow
Date of Award: 1994
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.297037  DOI: Not available
Keywords: Solid-state physics Solid state physics Plasma (Ionized gases)
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