Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.271250
Title: Study of silicon damage caused by ultra-low energy boron implantation
Author: Zhang, Shenjun.
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 2001
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.271250  DOI: Not available
Keywords: Solid-state physics Solid state physics Materials
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