Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.260288
Title: Chemical studies of plasma etchants used in integrated circuit manufacture
Author: Blaikley, D. C. W.
ISNI:       0000 0001 3466 7717
Awarding Body: Aston University
Current Institution: Aston University
Date of Award: 1991
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Phd
EThOS ID: uk.bl.ethos.260288  DOI: Not available
Keywords: Applied Chemistry ; Chemical Engineering Chemistry, Physical and theoretical Chemical engineering
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