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Title: Chemical studies of plasma etchants used in integrated circuit manufacture
Author: Blaikley, D. C. W.
ISNI:       0000 0001 3466 7717
Awarding Body: Aston University
Current Institution: Aston University
Date of Award: 1991
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No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Phd
EThOS ID:  DOI: Not available
Keywords: Applied Chemistry ; Chemical Engineering Chemistry, Physical and theoretical Chemical engineering