Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.253266
Title: Ion beam mixing in amorphous silicon.
Author: Jafri, Zaeem Hasan.
ISNI:       0000 0001 3588 4457
Awarding Body: University of Surrey
Current Institution: University of Surrey
Date of Award: 1990
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.253266  DOI: Not available
Keywords: Semiconductor thin films Solid state physics Nuclear physics
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