Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.244847
Title: A fundamental study of the formation of cubic-nitride films using ion-assisted deposition and graded Ti-B-N interlayers.
Author: Kobayashi, Toshiro.
Awarding Body: University of Salford
Current Institution: University of Salford
Date of Award: 1998
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.244847  DOI: Not available
Keywords: Thin films; Adhesion; Boron nitride coating Solid state physics
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