Use this URL to cite or link to this record in EThOS: http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.235735
Title: A study of shallow implants in silicon by secondary ion mass spectrometry.
Author: Fox, Harvey Stuart.
Awarding Body: University of Warwick
Current Institution: University of Warwick
Date of Award: 1989
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Abstract:
No abstract available
Supervisor: Not available Sponsor: Not available
Qualification Name: Thesis (Ph.D.) Qualification Level: Doctoral
EThOS ID: uk.bl.ethos.235735  DOI: Not available
Keywords: Silicon layer distortions
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